Last Updated: August 11, 2026

Details for Patent: 11,566,000


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Which drugs does patent 11,566,000 protect, and when does it expire?

Patent 11,566,000 protects SOFDRA and is included in one NDA.

This patent has twenty-four patent family members in seventeen countries.

Summary for Patent: 11,566,000
Title:Crystalline form of sofpironium bromide and preparation method thereof
Abstract:A cocrystal containing the 1′R-diastereomer and the 1'S-diastereomer of sofpironium bromide at a ratio of 1:3 (Form CO), a crystal mixture (for example, Form B) containing Form CO and a crystalline form of the 1′R-diastereomer (Form MN), and a method for preparing sofpironium bromide, which is suitable for manufacture of the crystal mixture are provided. Form CO and a crystalline form of sofpironium bromide containing Form CO (for example, Form B) have superior stability without hygroscopic property, and accordingly they can be preferably used as a raw material of medicaments.
Inventor(s):Kazuyoshi MARUBAYASHI, Masahito Watanabe, Herbert R. Brinkman
Assignee: Kaken Pharmaceutical Co Ltd , Botanix Sb Inc
Application Number:US17/105,376
Patent Claim Types:
see list of patent claims
Composition;
Patent landscape, scope, and claims:

Patent 11,566,000 scope and claims review: stable sofpironium bromide co-crystal Form CO (US claims, composition and formulation coverage)

United States Patent US 11,566,000 claims a specific stable sofpironium bromide co-crystal polymorph (“Form CO”) defined by (i) a 1:3 stoichiometric ratio of two defined co-formers (formula I-a and I-b), (ii) strict purity and impurity limits, (iii) physicochemical stability and non-hygroscopic behavior, and (iv) an objective DSC and PXRD fingerprint. The claims then extend to a topical pharmaceutical composition containing this Form CO and a manufacturing method for obtaining the active (Form CO) from sofpironium bromide using a specified solvent system (ethyl acetate + methyl t-butyl ether), filtration after stirring.


What does US 11,566,000 claim for sofpironium bromide co-crystal Form CO?

Short answer: Claim 1 defines the protected product as a particular co-crystalline solid form of sofpironium bromide, identified by compositional ratio, purity/impurity thresholds, non-hygroscopic stability, and a set of DSC and PXRD peaks.

Claim 1 structure and required limitations

Claim 1 is a closed, multi-parameter definition. An accused product must meet every enumerated requirement. Key elements:

  1. Identity as a co-crystal Form CO

    • “A stable co-crystal Form CO of sofpironium bromide”
  2. Stoichiometry requirement

    • Form CO “comprising in a 1:3 ratio
      • a) compound of formula I-a
      • b) compound of formula I-b
  3. Purity threshold tied to compound (I)

    • “purity of co-crystal Form CO is not less than 98% w/w based on the content of the compound (I)”
    • This means the solid must be predominantly the targeted sofpironium bromide-containing co-crystal entity as measured by “content of compound (I)” (as the patent defines).
  4. Stability and physical behavior

    • “physicochemically stable and non-hygroscopic
  5. DSC thermal fingerprint

    • “exhibits a single sharp endothermic peak value of 150°C
    • DSC is “as described in Japanese Pharmacopoeia (17th Edition).”
  6. PXRD fingerprint

    • “characterized as showing peaks at 5.9 ±0.2, 7.6 ±0.2, 11.0 ±0.2, and 22.2 ±0.2 degrees (2θ)”
    • “in a powder X-ray diffraction spectrum.”

Practical reading for enforceability: Claim 1 is a classic “form-by-function” claim where infringement turns on analytical testing of the accused solid. The claim does not merely say “co-crystal”; it requires the exact analytical signatures plus compositional and purity constraints.

Claim 1 infringement trigger tests

An enforcement posture typically tests:

  • Co-crystal identity: confirm the presence of both co-former components (I-a and I-b) at the required 1:3 ratio.
  • Purity and impurity profiling: confirm the “98% w/w based on content of compound (I)” requirement.
  • Non-hygroscopic and stability: confirm behavior under relevant humidity/conditioning used in the patent’s definition.
  • DSC: confirm a single sharp endothermic peak at 150°C.
  • PXRD: confirm peak positions within the stated tolerances.

Because the claim fixes tolerances (±0.2°) and requires a single DSC feature at 150°C, even small shifts or multiplet melting/endotherms can be asserted as non-infringing.


How do claims 2 and 3 narrow the co-crystal Form CO purity and impurity profile?

Short answer: Claims 2 and 3 add stricter quantitative constraints on minor constituents/impurities, tightening the product scope.

Claim 2: limit for compounds III/IV/V

Claim 2 states Form CO of claim 1 where:

  • “a content of each compound represented by formulae III, IV and V is not more than 0.5% w/w based on a content of compound (I).”

This is a specific impurity/composition limitation. Even if an accused solid matches the DSC/PXRD and ratio requirement, failing this impurity threshold can avoid coverage under Claim 2 (but not necessarily avoid Claim 1, depending on whether Claim 2 is an additional dependent limitation only for that dependent claim).

Claim 3: total impurities limit

Claim 3 states:

  • “the total content of impurities is not more than 2.0% w/w based on a content of compound (I).”

This provides another quantitative gate. In practice, impurity profiling is often the dispute driver in co-crystal form patents because analytical methods, reference standards, and thresholds matter.


What is protected beyond the co-crystal itself: topical composition claim 4?

Short answer: Claim 4 covers a topical pharmaceutical composition comprising the protected Form CO plus a pharmaceutically acceptable carrier.

Claim 4 requirements

  • “A stable topical pharmaceutical composition”
  • Made by mixing:
    • “a pharmaceutically effective amount of sofpironium bromide co-crystal Form CO according to claim 1
    • with “a pharmaceutically acceptable carrier.”

Key scope points:

  • It is not limited by concentration range of active ingredient in the text you provided.
  • It is not limited by specific topical vehicle type in the claim language shown; it is broadly “carrier.”
  • It is limited by the requirement that the API is Form CO as defined in Claim 1.

Infringement risk for formulators: If a generic or competitor uses a different solid form, or Form CO that fails one of the Claim 1 analytical thresholds, then Claim 4 coverage can be avoided (assuming no separate claims cover alternate forms or polymorphs).


What manufacturing method is claimed in claim 5, and what does it cover?

Short answer: Claim 5 claims a method to prepare the active Form CO using a specific solvent system for a sofpironium bromide suspension, with at least 1 hour stirring and then filtration to obtain the crystalline form.

Claim 5 step-by-step scope

Claim 5 states Claim 4 where the active agent (Form CO) is prepared by:

  1. “preparing a suspension of sofpironium bromide in a solvent comprising ethyl acetate and methyl t-butyl ether
  2. “stirring the suspension for at least 1 hour
  3. “and filtering the suspension to obtain the crystalline form of the active pharmaceutical agent.”

Implications:

  • The claim is method-forming, so a competitor manufacturing Form CO via a different solvent pair, different stirring time, or different isolation step may avoid Claim 5 while still potentially infringing Claim 1/4 if the resulting solid is the same protected Form CO.
  • The claim does not specify ratios of ethyl acetate to methyl t-butyl ether in the text provided; it only requires the solvent comprising both.

Design-around pathway: Using the same end product (Form CO) could still risk Claim 1/4 exposure even if Claim 5 is avoided. Conversely, using the same process but altering the produced solid so it fails the PXRD/DSC fingerprints can reduce product claim risk.


How strong is the patent estate around analytical-defined co-crystal solid forms?

Short answer: The claims you supplied rely on objective analytics (DSC and PXRD) plus quantitative composition constraints, which often improves proof in litigation but also makes non-infringement possible through controlled variation in crystallization outcome and impurity management.

Key strengths

  • Analytical specificity: PXRD peak positions with tolerances and a DSC single endotherm at 150°C create concrete identity criteria.
  • Purity and impurity thresholds: Claim 2 (0.5% w/w each for compounds III/IV/V) and Claim 3 (≤2.0% total impurities) provide additional measurable gates.
  • Composition and formulation coverage: Claim 1 covers the solid; Claim 4 covers topical formulations containing it.
  • Process hook: Claim 5 adds an additional independent infringement theory tied to manufacturing.

Key vulnerability

  • Form-by-form definition is testable. If a competitor obtains a different polymorph, amorphous content, or a co-crystal with shifted PXRD peaks or different DSC behavior, it can argue non-infringement.
  • Impurity testing variability: If Claim 2/3 become central, disputes can arise around impurity method, standards, and sample preparation.

What generic or competitor entry risks exist for sofpironium bromide topical products?

Short answer: The risk concentrates on competitors that use or generate exactly the claimed Form CO API and then formulate it into a topical product.

Risk scenarios

  1. Generic topicals using the same Form CO API

    • High risk for Claim 4 exposure.
    • High risk for Claim 1 if product form is challenged directly.
  2. Competitors producing Form CO by the same solvent method

    • Adds Claim 5 exposure if method steps are mirrored (ethyl acetate + methyl t-butyl ether; ≥1 hour stirring; filtration).
  3. Competitors using a different co-crystal form or polymorph

    • Potentially avoids Claim 1/4 if DSC and PXRD fingerprints differ enough to fall outside stated tolerances.
    • Must also manage purity/impurity profiles if aiming to still fall within Claim 2/3 ranges.

What analytical results matter most

  • PXRD peak positions (5.9, 7.6, 11.0, 22.2 degrees 2θ within ±0.2°)
  • DSC: a single sharp endothermic peak at 150°C
  • Purity ≥98% w/w based on compound (I) content
  • Impurity limits: individual ≤0.5% w/w and total ≤2.0% w/w

What patent “landscape” can be inferred from this claim set (within the limits of provided text)?

Short answer: Based on the claim architecture, the broader landscape most likely clusters around:

  • solid form patents for co-crystal/polymorph variants,
  • process patents for producing those solids,
  • and formulation patents for topical vehicles.

But the actual breadth, priority chain, and whether US 11,566,000 is part of a larger family set across jurisdictions cannot be confirmed from the claim text alone.

Inferred family structure by claim type

  • Product form claim (Claim 1): analytical fingerprint co-crystal Form CO.
  • Product form dependent claims (Claims 2-3): impurity control layers.
  • Formulation claim (Claim 4): topical composition.
  • Manufacturing method claim (Claim 5): solvent-based crystallization route.

This pattern aligns with typical strategies by originators: secure enforceable protection on the crystalline API identity, then extend to downstream product and upstream synthesis.


Claim-by-claim scope table for US 11,566,000 (based on supplied claim language)

Claim What it protects Essential limitations (must all be met) Key analytical gate
1 Stable sofpironium bromide co-crystal Form CO 1:3 ratio of I-a:I-b; purity ≥98% w/w; physicochemically stable; non-hygroscopic; DSC single sharp endotherm at 150°C; PXRD peaks at 5.9±0.2, 7.6±0.2, 11.0±0.2, 22.2±0.2 (2θ) DSC at 150°C; PXRD peak matching
2 Same as Claim 1 plus impurity ceiling per compounds III/IV/V Each of III/IV/V ≤0.5% w/w (based on compound I content) Quantitative impurity profiling
3 Same as Claim 1 plus total impurity ceiling Total impurities ≤2.0% w/w (based on compound I content) Total impurity profiling
4 Topical pharmaceutical composition Contains “pharmaceutically effective amount” of Form CO (Claim 1) + pharmaceutically acceptable carrier Identity of API Form CO
5 Method to make the active Form CO used in Claim 4 Suspend sofpironium bromide in solvent comprising ethyl acetate + methyl t-butyl ether; stir ≥1 hour; filter to obtain crystalline form Resulting solid must match Claim 1 if litigated under product claims

Key Takeaways

  • US 11,566,000 protects a highly specific crystalline entity: sofpironium bromide co-crystal Form CO defined by 1:3 stoichiometry (I-a:I-b), ≥98% w/w purity, non-hygroscopic stability, and tight DSC/PXRD fingerprints.
  • Dependent claims add impurity controls: ≤0.5% w/w each for compounds III/IV/V and ≤2.0% w/w total impurities.
  • Downstream protection includes topical formulations containing the claimed Form CO and a process for producing the Form CO via ethyl acetate + methyl t-butyl ether suspension crystallization with ≥1 hour stirring and filtration.
  • Competitor/generic risk centers on whether the API used in the topical product matches the precise analytical identity (DSC and PXRD) and meets the compositional/impurity thresholds; process differences can avoid Claim 5 but may still leave product-form claims at risk.

FAQs

  1. Can a competitor avoid infringement by shifting PXRD peaks slightly outside ±0.2° tolerances?
  2. How do impurity limits in Claims 2 and 3 affect design-around strategies for co-crystal Form CO?
  3. If a topical product uses Form CO obtained by a different solvent system than ethyl acetate + methyl t-butyl ether, does Claim 5 still apply?
  4. Does Claim 4 cover any topical dosage form or only specific vehicle types?
  5. What analytical sequence is most persuasive for confirming the claimed Form CO identity (PXRD versus DSC)?

More… ↓

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Drugs Protected by US Patent 11,566,000

Applicant Tradename Generic Name Dosage NDA Approval Date TE Type RLD RS Patent No. Patent Expiration Product Substance Delist Req. Patented / Exclusive Use Submissiondate
Botanix Sb SOFDRA sofpironium bromide GEL, METERED;TOPICAL 217347-001 Jun 18, 2024 RX Yes Yes 11,566,000 ⤷  Start Trial Y Y ⤷  Start Trial
>Applicant >Tradename >Generic Name >Dosage >NDA >Approval Date >TE >Type >RLD >RS >Patent No. >Patent Expiration >Product >Substance >Delist Req. >Patented / Exclusive Use >Submissiondate

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