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Last Updated: December 28, 2025

Claims for Patent: 5,795,685

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Summary for Patent: 5,795,685

Title:	Simple repair method for phase shifting masks
Abstract:	A method and apparatus for correcting defects in a phase shift mask to be used in photolithography. More specifically, the method of the invention includes creating a second repair mask which contains phase shifters. Regions surrounding the defects on the first mask are made opaque. The design circuitry located in these defective regions is copied onto the second mask. During a second exposure the design circuitry is placed onto the semiconductor wafer. Therefore, this method and apparatus provides an inexpensive solution to a difficult problem.
Inventor(s):	Lars W. Liebmann, Burn Jeng Lin, Mark O. Neisser
Assignee:	International Business Machines Corp
Application Number:	US08/783,631

Details for Patent 5,795,685

Glossary

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Applicant	Tradename	Biologic Ingredient	Dosage Form	BLA	Approval Date	Patent No.	Expiredate
Takeda Pharmaceuticals U.s.a., Inc.	KALBITOR	ecallantide	Injection	125277	December 01, 2009	⤷ Get Started Free	2017-01-14
>Applicant	>Tradename	>Biologic Ingredient	>Dosage Form	>BLA	>Approval Date	>Patent No.	>Expiredate

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