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Serving leading biopharmaceutical companies globally:

Argus Health
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Generated: November 18, 2017

DrugPatentWatch Database Preview

Details for Patent: 7,265,009

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Summary for Patent: 7,265,009

Title:HDP-CVD methodology for forming PMD layer
Abstract: A method of forming an HDP-CVD pre-metal dielectric (PMD) layer to reduce plasma damage and/or preferential sputtering at a reduced a thermal budget including providing a semiconductor substrate comprising at least two overlying semiconductor structures separated by a gap; forming a PMD layer according to an HDP-CVD process over the at least two overlying semiconductor structures without applying a chucking bias Voltage to hold the semiconductor substrate.
Inventor(s): Chen; Yao-Hsiang (Hsin-Chu, TW)
Assignee: Taiwan Semiconductor Manufacturing Co., Ltd. (Hsin-Chu, TW)
Application Number:11/067,043
Patent Claim Types:
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Use; Process;

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International Patent Family for Patent: 7,265,009

Country Document Number Estimated Expiration Supplementary Protection Certificate SPC Country SPC Expiration
China1832125► Subscribe
China100380624► Subscribe
Taiwan200631099► Subscribe
TaiwanI277155► Subscribe
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The estimated expiration dates shown above are derived by simply adding 20 years to the priority date.
Due to the complexity of determining patent expirations even in a single country, compounded by the diversity of global patent laws, it is advisable to have patent counsel verify freedom to operate.

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Serving leading biopharmaceutical companies globally:

Express Scripts
Farmers Insurance
Johnson and Johnson

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